基本解释：电子束蒸镀系统
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01)O thin films which has been prepared on the (001) plane of Si substrate by the method of e-beam evaporation.用X射线衍射方法分析了在Si(001)衬底上电子束蒸镀制备的Zn0。
050O thin films prepared by method of e-beam evaporation on Si substrate at 200～500℃for substrate temperatures(Ts) are characterized using x-ray diffraction method, which shows all these films orientating well along \ except the film prepared at 200℃ and having similar crystal parameters.在200～500℃的衬底温度范围内,用电子束蒸镀法在Si衬底上制备了沿[002]取向的Zn0。
ITO film used in semiconductor LED process is fabricated with vacuum E-beam evaporation.用真空电子束蒸镀的方法制备半导体发光二极管LED所用的ITO膜,然后在N2气环境中进行快速热退火(RTA)处理,对ITO膜的各项特性进行测试分析。
Characteristics of chromium-aluminum-silicon dioxide thin films deposited on PMMA glass substrate by electron beam evaporation process;有机玻璃基材表面电子束蒸镀铬-铝-二氧化硅薄膜及其性能研究
ZnO;Al(ZAO) films were prepared by electron beam evaporation on Si (100) substrates, followed by annealing in oxygen ambient from 400℃ to 800℃.采用电子束蒸镀方法在Si(100)衬底上沉积了ZnO:Al(ZAO)薄膜。
In this present paper,the operation technology for preparation of aluminium-chromium alloy coating by electron beam evaporation plating was studied.研究了电子束蒸发镀沉积Al-Cr合金涂层的工艺 ,探讨了铬含量对涂层耐蚀性的影响 ,对涂层的物相、形貌以及热处理对涂层和基体之间热扩散的影响进行了分析 。
The effect of RTA process on optical and electrical characters of E-beam evaporated ITO films快速热退火对电子束蒸镀的ITO膜光电特性影响
Study on Self-Plasma Assistant Electon Beam Evaporation Coatin自体等离子体辅助电子束蒸镀技术研究
Study on the Preparation of Intaglio Plate Wear-resistant Coatings by Means of Ion Assisted Electron Beam Physical Vapor Deposition;离子辅助电子束蒸镀制备凹印版材耐磨层的研究
High Performance ZnS Infrared Anti-Reflection Film Deposited by the Ion Assisted Deposition (IAD) Technology用离子束辅助蒸发工艺镀制高性能硫化锌红外增透膜
Characterization and Preparation of PbI_2 Thin Films Grown by Electron Beam Evaporation电子束蒸发制备PbI_2薄膜及其性能表征
Effect of N~+ Ion Beam Bombardment on the Properties of Arc-Ion-Plated TIN Films氮离子束轰击对电弧离子镀TiN膜层的作用
Study of the Optical and Electrical Characteristics of Aluminum-doped ZnO Thin Films Prepared by Electronic Beam Evaporation;电子束蒸发制备AZO薄膜的光电性能研究
Prepared TiN Thin Films by LTP Enhanced Electronic Beam Evaporation;低温等离子体增强电子束蒸发沉积TiN的研究
Ion Beam Bombardment and Variations in Stress of TiO_2 Films离子束轰击对电子束蒸发制备二氧化钛薄膜应力的影响
Multi-arc ion plating technique is using cool cathode with self-maintaining arc discharge as evaporation source.多弧离子镀技术是一种在真空中将冷阴极自持弧光放电用于蒸发源的镀膜技术。
Study of Oxide Optical Films Deposited by Bias-Voltage E-Beam Evaportation;偏压电子束蒸发沉积氧化物光学薄膜研究
Study of the Deposition and Optical Properties of TiO_2 Thin Films Deposited by Electronic Beam Evaporation;电子束蒸发制备TiO_2薄膜及光学性能的研究
The surface analysis of the c-BN film with electron beam method电子束蒸发制备立方氮化硼薄膜的表面分析
Study Of Stress in TiO_2 films grown by electron-beam evaporation电子束蒸发制备二氧化钛薄膜的应力研究(英文)
Preparation of Si_(0.95)Co_(0.05) DMS films by Electron Beam Evaporation Technology电子束蒸发制备Si_(0.95)Co_(0.05)稀磁半导体薄膜
Fabrication and Surface Analysis of Boron Carbide Thin Films by Electron Beam Evaporation碳化硼薄膜的电子束蒸发制备及表面分析
IR Spectra Characteristics of Boron Nitride Thin Films Deposited by Electron Beam Evaporation电子束蒸发制备氮化硼薄膜的红外光谱研究
Study on the Preparation and Properties of Light-Storing Ceramic Films Deposited by Alternate Electron Beam Evaporation Method电子束交替蒸发制备蓄能发光膜及其性能研究
