基本解释：密接-近接对准曝光器
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A x-y 2 dimension precision motion stage used in proximity exposure system was developed to meet the demand of manufacturing micro-optical elements by mask moving exposure technique.为满足掩模移动曝光技术制作微光学元件的要求,研制了接近式曝光系统中使用的x-y二维精密移动工件台。
The history and recent advances of this technology are reviewed, especially emphasis on important technical accomplishments and challenges in X ray sources, proximity exposure and all reflective projection lithography.重点讨论了在Ｘ射线源、接近式曝光和全反射投影曝光等方面取得的成就与存在的问题。
uv proximity printer紫外线接近式曝光装置
direct step on wafer薄片上步进式直接曝光
vacuum contact printer真空接触式曝光装置
bracket exposures包围式曝光，作多级增减曝光
reduction aligner收缩式投影曝光装置
projection stepper步进式投影曝光装置
Exposure metering user setting mode.曝光测定的设置模式
The AE lock mode locks the exposure value for precise exposure metering.自动曝光锁定模式可在精确曝光测定量时锁定曝光值
STUDY ON EFFICACY OF INDIRECT EXPOSURE PLASMA DISINFECTOR(IEPD) IN KILLING DIFFERENT MICROORGANISMS间接曝光式等离子体消(dú)机对不同微生物杀灭效果的研究
Turn the mode dial to select Auto bracketing mode.转动模式盘至包围式曝光模式。
aperture-priority automatic exposure camera光圈优先式曝光量自动控制照相机
Diffusion transfer: Paper negative exposed in the normal wayand develope incontact with positive material.扩散转移:用一般曝光法把纸底片曝光，然后和 片材料接触显影。
Photomechanical transfer (PMT): Paper negative exposed in the normal way and developed in contact with positive material.照相移印:用一般曝光法把纸底片曝光，然后和正片材料接触显影。
One by one the horses died of exposure.由于阳光曝晒，马一匹接一匹地死去。
Turn the mode dial to select multi exposure mode.把模式盘转到多重曝光模式。
Turn the mode dial to select exposure metering user setting mode.转动模式盘至曝光测定的设置模式
Exposure,radiographic exposure曝光,射线照相曝光
wafer stepper projection system薄片的步进式投影曝光装置
