基本解释：砷化铬
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Traditional copper surface roughening treatment involve the use of arsenide-containing electrolyte which is harmful to environment.对铜箔表面进行粗化处理,传统的粗化工艺中要使用砷化物,不仅操作不便而且危害环境。
The development course of low dimensional semiconductor materials and Ga-based nitride, arsenide semiconductor quantum dots are reviewed.综述了半导体低维结构以及镓基砷化物、氮化物材料量子点的发展,涉及了外延生长机理、量子点的形貌结构特征,并着重介绍了镓基氮化物材料量子点的制备方法、研究的现状、面临的困难、应用发展现状,并对其未来研究趋势提出了看法。
In this paper, polyferric silicate sulfate (PFSS) was prepared and arsenic-containing wastewater from gallium arsenide plant was flocculated by it.用自制的无机高分子聚合硅酸铁(PFSS),对砷化镓生产中的含砷废水进行了混凝处理。
Arsenic containing wastewater from gallium arsenide production was treated by coagulation process using self made polyferric metasilicate.用自制的聚合硅酸铁 (PFSiC)对砷化镓生产中的含砷废水进行混凝处理。
A great deal of wastewater was produced in the manufacturing of gallium arsenide wafers,and the main contamination was gallium arsenide particles in suspension.砷化镓晶片生产过程中 ,产生大量废水 ,其中主要污染物是悬浮状态的砷化镓微粒。
