基本解释：沉积平衡
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Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
Study on NiCoCrAlY Coating Using Unbalanced Magnetron Sputtering on Titanium Alloy Surface钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层
Discharge Properties of Unbalanced Magnetron Sputtering System and Application of TiN_x Films Deposition;非平衡磁控溅射沉积系统放电特性和沉积TiN_x薄膜应用研究
Study on Microstructure and Properties of CrAlN Coatings Deposited by Closed Field Unbalanced Megnetron Sputtering闭合场非平衡磁控溅射沉积的CrAlN薄膜组织结构和性能研究
Tribological Properties of Ti-DLC Film Deposited by Mid-frequency Dual-magnetron Sputtering中频非平衡磁控溅射沉积Ti-DLC膜摩擦磨损性能研究
Study of Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating Affected by Deposition Pressure沉积压力对非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与性能影响研究
Study of Structure and Tribological Properties in Vacuum of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering system非平衡磁控溅射沉积MoS_2-Ti复合薄膜的结构与真空摩擦磨损性能研究
Effects of the Magnetic Field Unbalance Coefficient on Deposition Process of Magnetron Sputtered Cr Coating;磁场非平衡度对磁控溅射Cr镀层沉积过程的影响
Influence of Operation Conditions on Deposition Rate of Planar DC Magnetron Sputtering工作参数对平面磁控溅射系统沉积速率的影响
Studies in the Technologies for the a-C:H Films Prepared by Middle Frequency Unbalanced Magnetron Sputtering;中频非平衡磁控溅射制备DLC膜的工艺研究
Analysis of Structure of Cr-doped GLC Coatings Deposited by Unbalanced Magnetron Sputtering非平衡磁控溅射掺Cr类石墨镀层的结构分析
Microstructures and Properties of Silicon Nitride Films Grown by Unbalanced Magnetron Sputtering非平衡磁控溅射制备氮化硅薄膜及其性能研究
Influence of oxidation temperature on microstructure and properties of unbalanced magnetron sputtered TiN coatings热氧化温度对非平衡磁控溅射TiN镀层的影响
Computer Simulation of Thin Film Deposition by RF Magnetron Sputtering;射频磁控溅射沉积薄膜的计算机模拟
Copper films on flexible PI subtrate prepared by roll magnetron sputtering卷绕式磁控溅射法沉积PI-Cu膜
Design, Manufacture and Application of an Unbalance and Close Magnetron Sputtering Equipment;非平衡闭合磁场磁控溅射设备的设计、制造及应用
Bias Voltage and Mechanical Properties of CrN Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering封闭磁场非平衡磁控溅射偏压对CrN镀层摩擦学性能影响
Structures Analysis and Luminescence Characteristics of Amorphous SiN_x Films Prepared by Magnetron Sputtering;磁控溅射法所沉积SiN_x非晶薄膜的结构分析及发光特性研究
