基本解释：电子求积化
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Quick surface metallization of titania powder was carried out by electroless chemical deposition of nickel.采用镍的无电子化学沉积方法研究了纳米二氧化钛粉末表面的快速金属化 。
The solving process is named as integral operator solving process, thus it is fended provide a new, simple and immediate solving process of the boundary value problems of abstract kinetic equations.将一类抽象Volterra型线性积分算子用于求解抽象动力方程边值问题 ,此方法称为积分算子求解法 。
We have obtained the solution of the boundary value problem of the abstract kinetic equation with a control parameter and reflecting boundary condition by integral operator solving process.用积分算子求解法 ,得到了具有反射边界条件的、含控制参数的抽象动力方程边值问题的解。
The new solving process is named as integral operator solving process.这种新的求解法我们称为积分算子求解
Hydrogen dissociation during the electron assisted chemical vapor deposition (EACVD) of diamond thin film is simulated by using the Monte Carlo method.采用蒙特卡罗方法模拟了电子辅助化学气相淀积 (EACVD)金刚石薄膜中的氢分解过程 ,建立了电子碰撞使氢分解的模型 ,给出了电子能量分布及氢原子数的空间分布 ,讨论了电偏压和气压对氢分解的影响。
The Research on the Gas Phase Process of Electron-Assisted Chemical Vapor Deposition from CH_4/H_2 Mixture Gas;CH_4/H_2系统电子助进化学气相沉积气相过程研究
Dynamics of EACVD in H_2/C_2H_2;H_2/C_2H_2系统电子助进热丝化学气相沉积动力学过程研究
Deposition of Al_2O_3 Thin Films by Electrostatic Spray Assisted Vapor Deposition Method静电辅助气溶胶化学气相沉积法制备Al_2O_3薄膜
Deposition of Y_2O_3 thin films by electrostatic spray assisted vapor deposition method静电辅助的气溶胶化学气相沉积法制备Y_2O_3薄膜
plasma activated chemical vapour deposition等离子体化学气相沉积
The Preparation of Nanocrystalline Diamond Films by Electron Assisted Chemical Vapor Deposition (EACVD) and the Researches on the Photo-electric Properties;电子辅助化学气相沉积法（EACVD）制备纳米金刚石薄膜及其光电性能的研究
Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征
TEM Study on Diamond Films Deposited by MPCVD;微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
thermally activated chemical vapour deposition热活化化学气相沉积
Application of chemical vapor deposition for electrode materials of lithium ion batteries化学气相沉积技术在锂离子电池电极材料中的应用
Preparation of Amorphous Silicon Nitride Film by ECRCVD;用电子回旋共振化学气相沉积(ECRCVD)方法制备非晶态氮化硅薄膜
epitaxial CVD growth外延化学气相沉积生长
Charge collection efficiency of chemical vapor deposition diamond film detector to alpha-particles化学气相沉积金刚石薄膜探测器对α粒子的电荷收集效率
Progress in EB-PVD Thermal Barrier Coatings电子束物理气相沉积热障涂层技术研究进展
Quantum chemistry methods and their applications to CVD reaction system化学气相沉积反应研究的量子化学方法及应用
Principle and research development of powder materials prepared by chemical vapor deposition化学气相沉积制备粉体材料的原理及研究进展
Atomization and Deposition Characteristic Research on Air-assisted Electrostatic Spraying气助式静电喷雾雾化及沉积特性研究
Improved quality of polycrystalline diamond grown by two-stage growth in microwave plasma chemical vapor deposition两段成长法改善微波电浆辅助化学气相沉积多晶金刚石之品质(英文)
